Growth of NbC Thin Film Using CH4 as a Carbon Source and Reducing Agent
نویسندگان
چکیده
منابع مشابه
Trimethylboron as Single-Source Precursor for Boron−Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition
Boron−carbon (BxC) thin films are potential neutron converting layers for B-based neutron detectors. However, as common material choices for such detectors do not tolerate temperatures above 500 °C, a low temperature deposition route is required. Here, we study trimethylboron B(CH3)3 (TMB) as a single-source precursor for the deposition of BxC thin films by plasma CVD using Ar plasma. The effec...
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ژورنال
عنوان ژورنال: Coatings
سال: 2018
ISSN: 2079-6412
DOI: 10.3390/coatings8110379